General Relationship for the Thermal Oxidation of Silicon
Explore this paper's citation graph
- Type
- article
- Published
- 1965-12-01
- Cited by
- 3,234
- References
- 19
- OpenAlex
- https://openalex.org/W2093914900
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:53763356
Keywords
Thermal oxidation, Silicon, Oxide, Diffusion, Partial pressure
References
- Kinetics of oxide film growth on metal crystals—I.: Formulation and numerical solutions
- Boundary Layer Theory
- Thermal Oxidation of Silicon
- Investigation of Oxidation of Copper by Use of Radioactive Cu Tracer
- Oxidation of Silicon by High‐Pressure Steam
- Effect of an Electric Field on Silicon Oxidation
- Evidence for Oxidation Growth at the Oxide‐Silicon Interface from Controlled Etch Studies
- Thermal Oxidation of Heavily Doped Silicon
- Theory of the oxidation of metals
- The Oxidation of Silicon in Dry Oxygen, Wet Oxygen, and Steam
- EFFECT OF CRYSTAL ORIENTATION ON OXIDATION RATES OF SILICON IN HIGH PRESSURE STEAM
- The mechanisms for silicon oxidation in steam and oxygen
- Growth and Structure of Si Oxide Films on Si Surface
- Oxygen exchange between silica and high pressure steam
- Water in silica glass
- Permeation of Gaseous Oxygen through Vitreous Silica
- Rates of Formation of Thermal Oxides of Silicon
- The High Temperature Oxidation of Silicon
Cited by
- Low Temperature Thermally Activated CVD of Silicon on Molybdenum for Oxidation Protection
- Nanosilicon in water as a source of hydrogen: size and pH matter
- A model SiC-based fibre with a low oxygen content prepared from a polycarbosilane precursor
- Nanolink-based thermal devices: integration of ALD TiN thin films
- DESIGN AND FABRICATION OF SERPENTINE-HINGED SILICON MICRO-MIRROR DEVICES
- Ultrathin silicon wafer bonding physics and applications
- SiO2 as an insulator for SiC devices
- Vers un matériau virtuel pour les composites céramiques
- DESIGN, FABRICATION, AND CHARACTERIZATION OF ELECTROSTATICALLY-ACTUATED SILICON MICRO-MIRRORS
- Manufacturing Gallium Doped ZnO Thin Films Suitable for Use in Thin Film Transistors Using Unbalanced Magnetron Sputtering
- Ductile Mode Material Removal of Ceramics and Semiconductors
- Corrosive degradation of a dense Si3N4 in a burner rig
- THE DESIGN AND FABRICATION OF AN ELECTROSTATICALLY ACTUATED DIAPHRAGM WITH A SILICON-ON-INSULATOR WAFER
- Prévision de la corrosion sèche des conteneurs de déchets radioactifs en condition d'entreposage : étude des mécanismes d'oxydation du fer à basse température et simulation numérique de la croissance d'une couche d'oxyde
- Hocheffiziente Industriesolarzellen mit selektiver Oberflächendotierung
- Nanoindentation of Annealed and As-Sputtered Thin Films of Nickel Titanium Shape Memory Alloys
- Oberflächenpassivierung von kristallinen Silizium-Solarzellen
- Dry and wet oxidation of an Si2N2O-ZrO composite material
- Organic transistors based on pentacene and dibenzothiophene derivatives
- Fabrication, Characterization, and Modelling of Self-Assembled Silicon Nanostructure Vacuum Field Emission Devices
Related papers
- Size-dependent oxidation behavior for the anomalous initial thermal oxidation process of Si
- The law of wet oxidation rate in 850nm VCSELs
- Numerical simulation for some kinds of complex chemical reaction kinetics
- Uncertain chemical reaction equation
- Effect of Oxygen Partial Pressure and Temperature on the Oxidation Behavior of SiB6
- Single-molecule chemical reaction reveals molecular reaction kinetics and dynamics
- Chemical reactions controlled through compartmentalization: Applications to bottom-up design of synthetic life
- Chemical Kinetics and Mass Action in Coexisting Phases
- Effects of geometry on the wet thermal oxidation of aluminum arsenide