Investigation of Oxidation of Copper by Use of Radioactive Cu Tracer

Keywords

Oxide, Copper, Metal, Diffusion, Radioactive tracer

References

• Diffusion und chemische Reaktion in festen StoffenJost, Wilhelm 1903-1988 — 1938
• Concentration of Radioactive Copper by Use of a High Speed Rotating CathodeJoseph Steigman — 1938

Cited by

• Influence of an Externally-Applied Static Charge on the Oxidation Kinetics of CopperShibayan Roy, Saptarshi Mitra, Saswata Bose — 1998
• Oxidation of Cobalt MetalR. E. Carter, F. D. Richardson, Carl Wagner — 1955
• Organic transistors based on pentacene and dibenzothiophene derivativesDaniel Kolb — 2008
• THE MECHANISM AND KINETICS OF THE REACTION BETWEEN NICKEL AND FLUORINERoger L. Jarry, W.H. Gunther, J. Fischer — 1963
• Cupric oxide inclusions in cuprous oxide crystals grown by the floating zone methodLaszlo Frazer, Kelvin B. Chang, Kenneth R. Poeppelmeier — 2015
• Über Fehlordnungszustände und Transportvorgänge in IonenkristallenKarl Häuffe, Bernhard Ilschner — 1954
• Polarization in Thorium Oxide CrystalsW.E. Danforth — 1955
• Materials science and integration bases for fabrication of (BaxSr1−x)TiO3 thin film capacitors with layered Cu-based electrodesW. J. Fan, B. Kabius, J. Hiller — 2003
• Oxygen tracer studies of the oxidation of niobiumJ.S. Sheasby, W. W. Smeltzer — 1981
• Diffusion of Gallium in SiliconA. D. Kurtz, C. L. Gravel — 1958
• Pressure dependencies of copper oxidation for low- and high-temperature parabolic lawsShibayan Roy, Saswata Bose, S. C. Sircar — 1991
• Der Konzentrationsgradient der Eisenionen-Leerstellen in Wüstit-Zunderschichten und der mechanismus der oxydation des eisensH.‐J. Engell — 1958
• Fractionation of Oxygen Isotopes in the Formation of Oxide Films on CopperJohn Brown, Malcolm Dole, G.A. Lane — 1957
• Über einige Halbleitereigenschaften des KupferoxydulsCarolin Fritzsche — 1955
• Properties of reactively-sputtered copper oxide thin filmsV.F. Drobny, L. Pulfrey — 1979
• Thermogravimetry of copper and copper oxides (Cu2O-CuO)Ana Lupu — 1970
• Field‐Enhanced Donor Diffusion in Degenerate Semiconductor LayersW. Shockley — 1961
• On the oxidation of siliconN. F. Mott — 1982
• Point defect diffusion and oxidation kinetics. Part IIFrançois Morin — 1973
• Calculation of the built-in electric field diffusion enhancement factorRajeev Kumar Jain — 1978

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