Low Temperature Thermally Activated CVD of Silicon on Molybdenum for Oxidation Protection
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- 2014-01-01
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References
- Kinetics and Mechanism of the Oxidation of Molybdenum
- Phase formation during reactive molybdenum-silicide formation
- Silicon sheet from silane: first results
- Handbook of Chemical Vapor Deposition (CVD). Principles, Technology and Applications. (Handbuch der chemischen Dampfabscheidung: Prinzipien, Techniken und Anwendungen). Von H. Pierson, Park Ridge/NJ: Noyes Publications 1992. 436 S., 1993, US‐ $ 68,‐
- Growth kinetics and reaction mechanism of silicon chemical vapour deposition from silane
- Structural and morphological studies of the growth of MoO3 scales during high-temperature oxidation of molybdenum
- The viscosity and thermal conductivity of pure monatomic gases from their normal boiling point up to 5000 K in the limit of zero density and at 0.101325 MPa
- Production of high-quality amorphous silicon films by evaporative silane surface decomposition
- Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications
- General Relationship for the Thermal Oxidation of Silicon
- Interaction of CVD Silicon with Molybdenum Substrates
- Design Study for a Low-Enriched Uranium Core for the High Flux Isotope Reactor, Annual Report for FY 2008
- Chemical vapour deposition of coatings
- Nerva Fuel Element Development Program Summary Report - July 1966 through June 1972 Impregnation Studies
- The options for the future production of the medical isotope 99Mo
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