Bonding characteristics of 3C-SiC wafers with hydrofluoric acid for high-temperature MEMS applications
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- Type
- article
- Published
- 2005-04-13
- Cited by
- 27
- References
- 22
- OpenAlex
- https://openalex.org/W1976659976
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:108958444
Keywords
Materials science, Surface roughness, Plasma-enhanced chemical vapor deposition, Hydrofluoric acid, Wafer
References
- SiO2 as an insulator for SiC devices
- Comparative surface studies on wet and dry sacrificial thermal oxidation on silicon carbide
- Wafer bonding of silicon wafers covered with various surface layers
- Heteroepitaxial growth of 3C–SiC using HMDS by atmospheric CVD
- Wafer-to-wafer fusion bonding of oxidized silicon to silicon at low temperatures
- Differences between silicon oxycarbide regions at SiCSiO2 prepared by plasma-assisted oxidation and thermal oxidations
- Heteroepitaxial growth of 3C-SiC on SOI for sensor applications
- A Model of Low‐Temperature Wafer Bonding And Its Applications
- Analysis of piezoresistance in n-type β-SiC for high-temperature mechanical sensors
- Effect of thermal oxidation on indentation and scratching of single-crystal silicon carbide on microscale
- Silicon carbide as a new MEMS technology
- Silicon carbide for microelectromechanical systems
- Thin SOI structures for sensing and integrated circuit applications
- Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review
- SiC MEMS: Opportunities and challenges for applications in harsh environments
- Monocrystalline silicon carbide nanoelectromechanical systems
- β-SiC films on SOI substrates for high temperature applications
- Evaluation of MEMS materials of construction for implantable medical devices.
- Studies on SiO2–SiO2 bonding with hydrofluoric acid. Room temperature and low stress bonding technique for MEMS
- Silicon carbide MEMS for harsh environments
Cited by
- Fabrication of SiCN microstructures for super-high temperature MEMS using PDMS mold and its characteristics
- Fabrication of SiCN microstructures for super-high temperature MEMS using photopolymerization and its characteristics
- Preparation and characterization of freestanding SiC(Ti, B) films derived from polycarbosilane with TiN and B as additives
- Characteristics of SiCN microstructures for harsh environment and high-power MEMS applications
- SiC sensors: a review
- Ohmic contacts to single-crystalline 3C-SiC films for extreme-environment MEMS applications
- Rapid bonding of Pyrex glass microchips
- 3C-SiC films on insulated substrates for high-temperature electrostatic-based resonators
- A note of microelectromechanical systems
- Advances in silicon carbide science and technology at the micro- and nanoscales
- The Piezoresistive Effect of SiC for MEMS Sensors at High Temperatures: A Review
- Fabrication of bonded SiC structure with cavity based on direct bonding process for MEMS device applications
- Formation of silicon carbide nanowire on insulator through direct wet oxidation
- Surface oxidation behavior in air and O2-H2O-Ar atmospheres of continuous freestanding SiC films derived from polycarbosilane
- EPR Spectroscopic Studies of Neutron-Irradiated Nanocrystalline Silicon Carbide (3C-SiC)
- Direct bonding of silicon carbide with hydrofluoric acid treatment for high-temperature pressure sensors
- Nanostrain Resolution Strain Sensing by Monocrystalline 3C-SiC on SOI Electrostatic MEMS Resonators
- Hydrophilic Direct Bonding of MgO/MgO for High-Temperature MEMS Devices
- Fabrication of SiC Sealing Cavity Structure for All-SiC Piezoresistive Pressure Sensor Applications
- Various thermal parameters investigation of 3C-SiC nanoparticles at the different heating rates
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