Principles of Plasma Discharges and Materials Processing
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- Type
- book
- Published
- 1994-10-28
- Cited by
- 7,809
- References
- 90
- OpenAlex
- https://openalex.org/W1480160699
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:93078094
Keywords
Plasma, Diffusion, Atomic physics, Kinetic energy, Collision theory
References
- Film deposition by plasma techniques
- Electrical Engineering: An Introduction
- Atomic collisions : heavy particle projectiles
- Theory of spherical and cylindrical Langmuir probes in a collisionless
- Radio waves in the ionosphere
- Potential energy curves for N2, NO, O2 and corresponding ions
- Collision phenomena in ionized gases
- Plasma diagnostics with microwaves
- Atomic Collisions: Electron and Photon Projectiles
- Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas
- Physics at surfaces
- An Introduction to Thermonuclear Research
- Basic Principles of Plasma Physics: A Statistical Approach
- The Spectra and Structure of Simple Free Radicals
- Fundamentals of surface and thin film analysis : North Holland, Amsterdam, 1986 (ISBN 0-444-00989-2). xviii + 352 pp. Price Dfl. 125.00.
- Sheath Heating in Low-Pressure Capacitive Radio Frequency Discharges
- Sputtering by particle bombardment
- Waves in plasmas.
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- Surface Properties of Hard Fluorinated Amorphous Carbon Films Deposited by Pulsed-DC Discharges
- Surface diffusion: the low activation energy path for nanotube growth.
- Inductively Coupled Nitrous Oxide Plasma Etching of Parylene-C Films
- Plasma-enhanced chemical vapor deposition synthesis of vertically oriented graphene nanosheets.
- Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms.
- Generation and control of reactive species in low temperature atmospheric pressure plasma sources.
- Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4∕O2 and SF6∕O2 plasmas
- Plasma Treatment of Polymers to Generate Stable, Hydrophobic Surfaces
- Characterization of ion sources for compact accelerator neutron production
- Laser propagation in dense magnetized plasma.
- Significant Improvement of Copper Dry Etching Property of a High-Pressure Hydrogen-Based Plasma by Nitrogen Gas Addition
- UV-Emission from Poly-Phase Molecular Discharge/Plasma Confined by Multi-Pole Magnetic Field
- Characterizing plasma with emission tomography-Feasibility study on synthetic and experimental data.
- Plasma Parameters Obtained with Planar Probe and Optical Emission Spectroscopy
- Plasma assisted technology for Si-based photonic integrated circuits
- A method for modelling radio frequency deposition or etch plasma chambers using an equivalent electronic component circuit
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- Book reviewPrinciples of plasma discharges and material processing: M.A. Lieberman and A.J. Lichtenberg, John Wiley, New York, 1994, 572 pp
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