Inductively Coupled Nitrous Oxide Plasma Etching of Parylene-C Films

Keywords

Nitrous oxide, Inductively coupled plasma, Parylene, Materials science, Etching (microfabrication)

References

• Principles of Plasma Discharges and Materials ProcessingM. A. Lieberman, A. J. Lichtenberg — 1994

Cited by

• Plasma Reactors and Plasma Thrusters Modeling by Ar Complete Global ModelsChloé Berenguer, K. Katsonis — 2012
• Global Modeling of N2O Discharges: Rate Coefficients and Comparison with ICP and Glow Discharges ResultsK. Katsonis, Chloé Berenguer — 2013
• Gliding arc plasma assisted N2O dissociation for monopropellant propulsionFranco Javier Bosi, Danil Dobrynin — 2017
• Development of global models of plasma systems for space propulsionFranco Javier Bosi — 2016

Related papers

• Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas SourceAkihiro Matsutani, Hideo Ohtsuki, Fumio Koyama — 2011
• Optimization of etching power for surface-modified diamond films based on inductively coupled oxygen plasmaDazhi Sun — 2011
• Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas SourceAkihiro Matsutani, Hideo Ohtsuki, Fumio Koyama — 2011
• MICROFABRICATION TECHNIQUE BY GAS PLASMA ETCHING METHODHiroyoshi Komiya, Hirotaka Toyoda, Takaya Kato — 1975
• Microfabrication Technique by Gas Plasma Etching MethodHiroyoshi Komiya, Hiroyasu Toyoda, Tadao Kato — 1975
• SiC Plasma and Electrochemical Etching for Integrated Technology ProcessesNour Beydoun, Mihai Lazar, Xavier Gassmann — 2023
• A novel two-step etching to suppress the charging damages during metal etching employing helicon wave plasmaHuang‐Chung Cheng, Wendy Lin, Tzong-Kuei Kang — 1998
• Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InPAkihiro Matsutani, Hideo Ohtsuki, Fumio Koyama — 2002
• Inductively coupled plasma etching of InP using N2/H2Hsin‐Yi Chen, Harry E. Ruda, Alvaro Zapata Navarro — 2001