Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms.
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Summary
A comparison with the reference case of an electrically asymmetric dual-frequency discharge reveals that the control range of the mean ion energy can be significantly enlarged by using more than two consecutive harmonics.
- Type
- article
- Published
- 2015-05-26
- Cited by
- 39
- References
- 65
- OpenAlex
- https://openalex.org/W1579714934
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:9377049
Keywords
Harmonics, Waveform, Voltage, Radio frequency, Impedance matching
References
- Principles of Plasma Discharges and Materials Processing
- Dynamics and Electronegativity of Oxygen RF Plasmas
- Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
- Plasma Electronics: Applications in Microelectronic Device Fabrication
- Fundamental aspects of substrate biasing: ion velocity distributions and nonlinear effects
- Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms
- Plasma etching: Yesterday, today, and tomorrow
- Transition from a capacitive to a resistive regime in a silane radio frequency discharge and its possible relation to powder formation
- Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments
- Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations
- Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique
- Intrinsic microcrystalline silicon: A new material for photovoltaics
- Evaluation of the Electrical Asymmetry Effect by spectroscopic measurements of capacitively coupled discharges and silicon thin film depositions
- Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments
- Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring
- Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms
- Control of ion energy distribution at substrates during plasma processing
- Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode.
- Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometrical transparency and collisional effects
- On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric
Cited by
- Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect
- Experimental investigations of electron heating dynamics and ion energy distributions in capacitive discharges driven by customized voltage waveforms
- Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4
- Experimental and simulation study of a capacitively coupled oxygen discharge driven by tailored voltage waveforms
- Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4
- The influence of electron reflection/sticking coefficients at the electrodes on plasma parameters in particle-in-cell simulations of capacitive radio-frequency plasmas
- Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects
- A Simple Model for Ion Flux‐Energy Distribution Functions in Capacitively Coupled Radio‐Frequency Plasmas Driven by Arbitrary Voltage Waveforms
- Electrode-selective deposition/etching processes using an SiF4/H2/Ar plasma chemistry excited by sawtooth tailored voltage waveforms
- Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges
- Enhanced power coupling efficiency in inductive discharges with RF substrate bias driven at consecutive harmonics with adjustable phase
- Plasma characteristics in an electrically asymmetric capacitive discharge sustained by multiple harmonics: operating in the very high frequency regime
- Multi frequency matching for voltage waveform tailoring
- Microcrystalline silicon thin film deposition from silicon tetrafluoride: Isolating role of ion energy using tailored voltage waveform plasmas
- Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
- Voltage waveform tailoring in radio frequency plasmas for surface charge neutralization inside etch trenches
- Customized ion flux-energy distribution functions in capacitively coupled plasmas by voltage waveform tailoring
- Expanding the toolbox of atomic scale processing
- Control of electron dynamics, radical and metastable species generation in atmospheric pressure RF plasma jets by Voltage Waveform Tailoring
- Ion composition of rf CCP in Ar/H2 mixtures
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