Ga2O3 Thin Film Growth on c-Plane Sapphire Substrates by Molecular Beam Epitaxy for Deep-Ultraviolet Photodetectors
Explore this paper's citation graph
- Type
- article
- Published
- 2007-11-06
- Cited by
- 464
- References
- 17
- OpenAlex
- https://openalex.org/W2070759111
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:122468105
Keywords
Molecular beam epitaxy, Sapphire, Ohmic contact, Materials science, Photodetector
References
- Deep-ultraviolet transparent conductive β-Ga2O3 thin films
- Individual β-Ga2O3 nanowires as solar-blind photodetectors
- 200nm deep ultraviolet photodetectors based on AlN
- Preparation and electrical properties of ultrafine Ga2O3 nanowires.
- Preparation, structure and electrical properties of epitaxial films of Ga2O3 on sapphire substrates☆
- Photocatalytic activities and photophysical properties of Ga2−xInxO3 solid solution
- Molecular beam epitaxial growth of wide bandgap ZnMgO alloy films on (111)-oriented si substrate toward UV-detector applications
- MBE growth and properties of ZnO on sapphire and SiC substrates
- Sol-gel prepared β-Ga2O3 thin films for ultraviolet photodetectors
- 247 nm solar-blind ultraviolet p-i-n photodetector
- Effect of annealing temperature on structural transformation of gallium based nanocrystalline oxide thin films and their optical properties
- Investigation of ZnO epilayers grown under various Zn/O ratios by plasma-assisted molecular-beam epitaxy
- Application of sol-gel method in the synthesis of gallium(III)-oxide
- Single Schottky-barrier photodiode with interdigitated-finger geometry: Application to diamond
- Molecular Beam Epitaxy of High Magnesium Content Single-Phase Wurzite MgxZn1-xO Alloys (x≃0.5) and Their Application to Solar-Blind Region Photodetectors
- Gallium oxide films for filter and solar-blind UV detector
- Polymorphism of Ga2O3 and the System Ga2O3—H2O
Cited by
- Oxygen-radical-assisted pulsed-laser deposition of β-Ga2O3 and β-(AlxGa1−x)2O3 films
- Room-temperature fabrication of highly oriented β-Ga2O3 thin films by excimer laser annealing
- Evaluation of Misfit Relaxation in α-Ga2O3 Epitaxial Growth on α-Al2O3 Substrate
- Photoelectric properties of β-Ga2O3 thin films annealed at different conditions
- Electrical properties of Si doped Ga2O3 films grown by pulsed laser deposition
- Crystal orientations of β‐Ga2O3 thin films formed on n‐plane sapphire substrates
- Growth of β‐Ga2O3 on Al2O3 and GaAs using metal‐organic vapor‐phase epitaxy
- Device-Quality β-Ga2O3 Epitaxial Films Fabricated by Ozone Molecular Beam Epitaxy
- Cross‐sectional TEM imaging of β‐Ga2O3 thin films formed on c‐plane and a‐plane sapphire substrates
- Electrochemical Deposition of GaSxOy Thin Films
- Crossed Ga2O3/SnO2 multiwire architecture: a local structure study with nanometer resolution.
- Epitaxial growth and solar-blind photoelectric properties of corundum-structured α-Ga2O3 thin films
- The competing oxide and sub-oxide formation in metal-oxide molecular beam epitaxy
- Lattice parameters and Raman-active phonon modes of β-(AlxGa1−x)2O3
- Electrical Conductive Corundum-Structured α-Ga2O3 Thin Films on Sapphire with Tin-Doping Grown by Spray-Assisted Mist Chemical Vapor Deposition
- Site preference of cation vacancies in Mn-doped Ga2O3 with defective spinel structure
- MBE grown Ga2O3 and its power device applications
- Hydrogen gas sensor with self temperature compensation based on β-Ga2O3 thin film
- Pulsed laser deposition of gallium oxide films for high performance solar-blind photodetectors
- Quasi-heteroepitaxial growth of β-Ga2O3 on off-angled sapphire (0 0 0 1) substrates by halide vapor phase epitaxy
Related papers
- Analysis on the new mechanisms of low resistance stacked Ti/Al Ohmic contact structure on AlGaN/GaN HEMTs
- Mechanisms of Ohmic Contact Formation of Ti/Al-Based Metal Stacks on p-Doped 4H-SiC
- High-Temperature Heat-Treatment of c-, a-, r-, and m-Plane Sapphire Substrates in Mixed Gases of H2 and N2
- Si ohmic contacts on N-type SiC
- Ohmic Contacts on p-Type GaN
- Formation of Ohmic contacts in AlGaN/GaN HEMT structures at 500 degreeC by Ohmic contact recess etching
- Atomic-level Chemical Reaction Promoting External Quantum Efficiency of Organic Photodetector Exceeding 10^8% for Weak-Light Detection
- Atomic-level chemical reaction promoting external quantum efficiency of organic photomultiplication photodetector exceeding 108% for weak-light detection.
- Performance Simulation of Unipolar InAs/InAs1−xSbx Type-II Superlattice Photodetector
- 4H-SiC PIN Recessed Window Avalanche Photodiode