High-mobility three-atom-thick semiconducting films with wafer-scale homogeneity

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Summary

The preparation of high-mobility 4-inch wafer-scale films of monolayer molybdenum disulphide and tungsten disulPHide, grown directly on insulating SiO2 substrates, with excellent spatial homogeneity over the entire films are reported, a step towards the realization of atomically thin integrated circuitry.

Type
article
Published
2015-04-30
Cited by
1,787
References
33

Keywords

Materials science, Monolayer, Optoelectronics, Nanotechnology, Electron mobility

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