Simple method for cleaning gallium nitride (0001)
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- Type
- article
- Published
- 2002-09-05
- Cited by
- 49
- References
- 8
- OpenAlex
- https://openalex.org/W2039602646
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:96311970
Keywords
Sulfuric acid, Gallium nitride, Decomposition, Hydrogen peroxide, Torr
References
- Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition
- The dependence of the structure and electronic properties of wurtzite GaN surfaces on the method of preparation
- Study of oxygen chemisorption on the GaN(0001)‐(1×1) surface
- Ex Situ and in Situ Methods for Oxide and Carbon Removal from AlN and GaN Surfaces
- Cleaning of AlN and GaN surfaces
- Cleaning of GaN surfaces
- Nature of native oxide on GaN surface and its reaction with Al
- Characteristic of InGaN/GaN Laser Diode Grown by a Multi-Wafer MOCVD System
Cited by
- Interface Trap Density Reduction for Al2O3/GaN (0001) Interfaces by Oxidizing Surface Preparation prior to Atomic Layer Deposition.
- Injection Laser Using Rare Earth Doped GaN Thin Films for Visible and Infrared Applications
- The possibly important role played by Ga2O3 during the activation of GaN photocathode
- Optimization and characterization of III–V surface cleaning
- Practical Surface Treatments and Surface Chemistry of n-Type and p-Type GaN
- High quantum efficiency of depth grade doping negative-electron-affinity GaN photocathode
- Effect of Cs adsorption on the photoemission performance of GaAlAs photocathode.
- Etch rate and surface morphology control in photoelectrochemical etching of GaN
- Preparation of clean GaAs(100) studied by synchrotron radiation photoemission
- Comparison of first and second annealing GaN photocathode
- Reproducible increased Mg incorporation and large hole concentration in GaN using metal modulated epitaxy
- Investigation on the role of indium in the removal of metallic gallium from soft and hard sputtered GaN (0001) surfaces
- Preparation of clean InP(100) surfaces studied by synchrotron radiation photoemission
- Analysis of GaN cleaning procedures
- Oxygen species in Cs/O activated gallium nitride (GaN) negative electron affinity photocathodes
- High-temperature molecular beam epitaxial growth of AlGaN/GaN on GaN templates with reduced interface impurity levels
- Electronic surface and dielectric interface states on GaN and AlGaN
- Negative electron affinity group III-nitride photocathode demonstrated as a high performance electron source
- Effectiveness of in situ NH3 annealing treatments for the removal of oxygen from GaN surfaces
- High-resolution X-ray photoemission study of photo-grown Ga2O3 in GaN/AlGaN/GaN heterostructures on Si substrates
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