Investigations of radio-frequency, capacitively-coupled large area industrial reactor
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- Published
- 2007-01-01
- Cited by
- 1
- References
- 169
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:134237328
References
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- Progress in up-scaling of thin film silicon solar cells by large-area PECVD KAI systems
- Study of radio-frequency plasma deposition of amorphous silicon for the improvement of solar cell production
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- Defect formation during growth of hydrogenated amorphous silicon.
- Total SiH4/H2 pressure effect on microcrystalline silicon thin films growth and structure
- Glow discharge processing in the liquid crystal display industry
- High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma
- FTIR spectroscopic study on liquid silica solutions and nanoscale particle size determination
- Optimization of the microcrystalline silicon deposition efficiency
- High rate growth of microcrystalline silicon by VHF-GD at high pressure
- Spectroscopic diagnostics and modelling of silane microwave plasmas
- Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD
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