Accurately computed dimerization fraction of ALD precursors and their impact on surface reactivity in area-selective atomic layer deposition

Keywords

Atomic layer deposition, Reactivity (psychology), Deposition (geology), Layer (electronics), Fraction (chemistry)

References

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• Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and PrecursorsYujin Lee, Amnon Rothman, Alexander B. Shearer — 2025

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