Spot Electron-Beam Lithography as a Novel Method of High Resolution Pattern Nanofabrication
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- Type
- article
- Published
- 2014-04-01
- Cited by
- 0
- References
- 5
- OpenAlex
- https://openalex.org/W1983243898
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:137525853
Keywords
Nanolithography, Materials science, Electron-beam lithography, Stencil lithography, Lithography
References
- Resolution limits of electron-beam lithography toward the atomic scale.
- 3-D Architectural Approach for Manipulation of the Micromagnetic Configuration in Nanodisks
- Competition between vortex and "s"-like states in laterally confined magnetic trilayers
- Resist requirements and limitations for nanoscale electron-beam patterning
- Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography
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