Rapid, low-temperature synthesis of nc-Si in high-density, non-equilibrium plasmas : enabling nanocrystallinity at very low hydrogen dilution

Keywords

Silane, Analytical Chemistry (journal), Silicon, Chemical vapor deposition, Hydrogen

References

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Cited by

• Single-step, rapid low-temperature synthesis of Si quantum dots embedded in an amorphous SiC matrix in high-density reactive plasmasQijin Cheng, Shuyan Xu, Kostya Ostrikov — 2010
• Controlled-bandgap silicon nitride nanomaterials : deterministic nitrogenation in high-density plasmasQijin Cheng, Shengzhi Xu, Kostya Ostrikov — 2010
• Temperature-dependent growth mechanisms of low-dimensional ZnO nanostructuresQijin Cheng, Kostya Ostrikov — 2011
• Directional growth of nanocrystalline Si nanorod array by mid‐frequency magnetron sputteringJunhua Gao, Liang Wu, Chengjun Tu — 2015
• Preferential 〈220〉 crystalline growth in nanocrystalline silicon films from 27.12 MHz SiH4 plasma for applications in solar cellsPraloy Mondal, Debajyoti Das — 2015
• Charged nanoparticles in thin film and nanostructure growth by chemical vapour depositionNong‐Moon Hwang, Dong-Kwon Lee — 2010
• Effect of mesh bias on the properties of the lateral conductivity of intrinsic microcrystalline silicon films deposited by low-frequency inductively coupled plasmaWenjin Yan, Shaohui Xu, C C Sern — 2011
• Relating plasma processing, surface morphology, and electronic properties of nanomaterialsV. Ligatchev — 2011
• Effects of ion bombardment on microcrystalline silicon growth by inductively coupled plasma assistant magnetron sputteringYangyang He, Yuanjun Su, Ming Zhu — 2012
• Impact of hydrogen dilution on optical properties of intrinsic hydrogenated amorphous silicon films prepared by high density plasma chemical vapor deposition for solar cell applicationsHuai‐Yi Chen, Yao‐Jen Lee, Chien-Pin Chang — 2013
• RF power dependence of the properties of n-type nanocrystalline silicon films deposited by a low-frequency inductively coupled plasmaWenjin Yan, Shengzhi Xu, C C Sern — 2011
• Property-performance control of multidimensional, hierarchical, single-crystalline ZnO nanoarchitectures.Qijin Cheng, Kostya Ostrikov — 2012
• Crystallization mechanism of silicon quantum dots upon thermal annealing of hydrogenated amorphous Si-rich silicon carbide filmsGuozhi Wen, Xiangbin Zeng, Wugang Liao — 2014
• Highly doped p-type microcrystalline silicon thin films fabricated by a low-frequency inductively coupled plasma at a low temperatureWenjin Yan, D. Y. Wei, Shaohui Xu — 2011
• Density improvement of silicon nanocrystals embedded in silicon carbide matrix deposited by hot-wire CVDKaifeng Bi, Yanhong Liu, Kun Liu — 2013
• Well dispersed silicon nanospheres synthesized by RF thermal plasma treatment and their high thermal conductivity and dielectric constant in polymer nanocompositesGuolin Hou, Benli Cheng, Fei Ding — 2015
• Generation of Charged Nanoparticles and Their Deposition Behavior under Alternating Electric Bias during Chemical Vapor Deposition of SiliconWoong-Kyu Youn, Chansoo Kim, Jaeyoung Lee — 2012
• Size effect on electronic transport in nC-Si/SiOx core/shell quantum dotsDebajyoti Das, Arup Samanta — 2012
• Low-temperature plasma processing for Si photovoltaicsShaoqing Xiao, Shuyan Xu, Kostya Ostrikov — 2014
• Plasma-aided fabrication in Si-based photovoltaic applications: an overviewShaoqing Xiao, Shuyan Xu — 2011

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