Total concentration fixed-grid method for wet chemical etching process.
Explore this paper's citation graph
- Published
- 2007-01-01
- Cited by
- 0
- References
- 47
- Semantic Scholar
- https://api.semanticscholar.org/CorpusID:136781887
References
- Anisotropic Etching of Crystalline Silicon in Alkaline Solutions II . Influence of Dopants
- Anisotropic Etching of Crystalline Silicon in Alkaline Solutions I . Orientation Dependence and Behavior of Passivation Layers
- Hydrofluoric Acid Etching of Silicon Dioxide Sacrificial Layers II . Modeling
- Etching Profiles at Resist Edges: I . Mathematical Models for Diffusion‐Controlled Cases
- Centrifugal Etching: A Promising New Tool to Achieve Deep Etching Results
- ERAL SOURCE-BASED METHOD FOR SOLIDIFICATION PHASE CHANGE
- A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching
- ENTHALPY-POROSITY TECHNIQUE FOR MODELING CONVECTION-DIFFUSION PHASE CHANGE: APPLICATION TO THE MELTING OF A PURE METAL
- Computational analysis of etched profile evolution for the derivation of 2D dopant density maps in silicon
- Simulation of anisotropic wet-chemical etching using a physical model
- A fixed grid numerical methodology for phase change problems involving a moving heat source
- A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and T
- Modelling of sacrificial aluminium etching in complex geometries
- Microfluidics-a review
- Crystallographic Wet Chemical Etching of p‐Type GaN
- Mathematical modelling of solidification and melting: a review
- Etching of Deep Macropores in 6 in. Si Wafers
- A new theory for the anisotropic etching of silicon and some underdeveloped chemical micromachining concepts
- Controlled Etching of Silicon in the HF ‐ HNO 3 System
- Anisotropic Etching of Silicon
Cited by
No citing papers recorded for this paper.
Related papers
No related papers recorded.