Processing, reliability and integration issues in chemical mechanical planarization

Keywords

Chemical-mechanical planarization, Reliability (semiconductor), Reliability engineering, Computer science, Forensic engineering

References

• Chemical-mechanical planarization of semiconductor materialsMichael R. Oliver — 2004
• High Resolution XPS of Organic Polymers: The Scienta ESCA300 DatabaseG. Beamson, Dayrl P. Briggs — 1992
• Polyolefins : modification of structure and propertiesA.G. Sirota — 1971
• VLSI metallization : physics and technologiesKrishnai Shenai — 1991
• Metallization: Theory and practice for VLSI and ULSIS. Murarka — 1992
• Modeling of chemical mechanical polishing for dielectric planarizationDennis O. Ouma — 1998
• Silicon Processing for the VLSI EraStanley M. Wolf, R. N. Tauber — 1986
• Engineering with surface coatings: The role of coating microstructureD.S. Rickerby, S.J. Bull — 1989
• Chemical Mechanical Planarization of Microelectronic MaterialsJoseph M. Steigerwald, S. P. Murarka, R.J. Gutmann — 1997
• Modeling of chemical mechanical polishing for shallow trench isolationBrian Lee — 2002
• Material removal mechanism in chemical mechanical polishing: theory and modelingJianfeng Luo, David Dornfeld — 2001
• Modeling of chemical mechanical polishing for shallow trench isolationTerence Gan — 2000
• Wear characterization of polyurethane chemical mechanical polishing padsSusan R. Machinski — 2001
• Patent pendingMarc E. Brown — 1995

Cited by

• Kinematic analysis of in situ measurement during chemical mechanical planarization process.Hongkai Li, Tongqing Wang, Qian Zhao — 2015
• Physical and statistical analysis of functional process variables for process control in semiconductor manufacturingXi Zhang — 2009
• Statistical and Experimental Analysis of Correlated Time-Varying Process Variables for Conditions Diagnosis in Chemical–Mechanical PlanarizationXi Zhang, Hui Wang, Qiang Huang — 2009
• Consumable Process Development for Chemical Mechanical Planarization of Bit Patterned Media for Magnetic Storage FabricationJoseph Bonivel — 2010
• Evaluation of Chemical Mechanical Planarization Capability of TitanTM Wafer Carrier on Silicon OxideAvancerad Nivå — 2017

Related papers

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• Modeling planarization in chemical-mechanical polishingDilek Alagöz, Stephanie Hoogendoorn, Satyanarayana Kakollu — 2002
• Planarization improvement using non-porous polishing pad in ILD CMPChe-Chin Yang, Kai En Lin, Wei-Nan Fang — 2015